A5: 실험 일기, experiment note

For the deposition DNTT on crystalline surface, in this case Ag(111), Ag sputtering deposited on Mica is used. 

Before the deposition, here is Ag/Mica preparation procedure. 

Ag/Mica substrate Preperation

  • Heating up to 550K. Slow heating rate -> 0.1 K/s

Mica contains moisture. we need to evaporate the water.  As slow heating the substrate, we avoid dramatic water expansion which can crush Mica. (slowly desorb water out of Mica)

  • Sputtering @800V for 15min, Heating at 600K

Sputtering/ Danial

Manual heating to 600K

Adjust : Spannung 215V,  Fila-strom, 1.80A /
not Adjust Strom 1.40A,

 

To make clean and smoother surface.

 

  • Sputtering @800V for 15min, Heating at 730K

 

  • Sputtering @800V for 15min, Heating at 730K (one more time)
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